300mm substrate compatible load-lock sputtering system
This is a device that supports the automatic transport of large substrates and can be applied from research and development to mass production. We will design it to meet your company's requirements.
This is a load-lock type sputtering device designed for the automatic transport of large substrates. 【Main Features】 - Capable of bare transport of large-diameter substrates, such as Φ300mm (support for square substrates is also possible). - Ensures a wide range of film thickness distribution with a uniquely designed cathode mechanism using standard target sizes. - Chamber structure that allows for easy target replacement and inspection/repair of the deposition chamber. - Future expansion of the process chamber is also possible. - Optionally equipped with a unique dense film formation unit (patented technology). We can also provide a video introduction of the device. Please feel free to contact us.
- Company：神港精機 東京支店
- Price：Other
